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Software Tool - CFD-TOPO
Run-to-Run Control of Inductively Coupled C2F6 Plasma Etching of SiO2: Construction of a Numerical Process with a CFD Code
Seung Taek Seo, Kwang Soon Lee and Bum Kyoo Choi Sogang University Yong Hee Lee Samsung Electronics Dae Rook Yang Korea University
Simulation of Photoresist Thermal Flow Process with Viscous Flow Model
Won-Young Chung, Tai-Kyung Kim, Yero Lee, Jin-Young Yoon, Hyun-Woo Kim, Young-Kwan Park and Jeong-Taek Kong Samsung Electronics
 
Simulation technique for the PR flow process using a new viscous flow model
Won-Young Chung, Tai-Kyung Kim, Jin-Young Yoon, Hyun-Woo Kim, Young-Kwan Park, and Jeong-Taek Kong Samsung Electronics
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