CFD-ACE+ Tips [more...]Modeling Momentum Loss in CFD-ACE+
In engineering systems, the presence of obstacles in the flow path provides resistance to flow accompanied by a pressure drop across the component. Often, the flow paths within such components are too complex to be resolved by a mesh (assuming it is known) and only the macro effects are of interest to design engineers.
CFD-FASTRAN Tips [more...]Avoiding Chimera Errors in CFD-FASTRAN
This note discusses a
common error encountered by users when trying chimera meshes in CFD-FASTRAN.
Such errors are easy
to avoid and hopefully this note will assist you.
CFD-GEOM Tips [more...]New Exposed Boundaries Visualization tool in CFD-GEOM
One of the various new features introduced in CFD-GEOM V2009.2 is the ‘Exposed Boundaries’
visualization tool. This tool allows users to quickly visualize those areas where closure
problems remain in an otherwise closed and “watertight” model.
CFD-VisCART Tips [more...]Cell Size Growth Control in CFD-VisCART
In CFD-VisCART, the Cartesian cells can split or grow by a minimum factor of 2 because
of the intrinsic cartesian-cell-splitting algorithm. Due to this, in some cases,
there is a chance that the mesh could grow from dense (at the wall) to coarse (away from the wall)
within a short distance.
CFD-VIEW Tips [more...]Using Macros in CFD-VIEW
In some cases, you might have to perform the same task several times to post-process your results
in CFD-VIEW. This can happen for example when you are running a parametric study and need to extract
the same information from all the solution files. In this case, it might be time-saving to use
the Macro option of CFD-VIEW, especially if obtaining the information necessitates many operations.
CFD-CADalyzer Tips [more...]Inverting Models in CFD-CADalyzer
Computational Fluid Dynamics (CFD) requires the discretization of a
geometry bounded by it's wetted surfaces. In CAD, the solid parts are
created without the corresponding fluid volumes, i.e. negative space.
CFD-TOPO Tips [more...]CFD-ACE+ and CFD-TOPO Coupling
There is a growing demand and challenge in different
industries, especially semiconductor and MEMS areas,
to have increased wafer size with reduced feature
size, i.e. high quality process uniformity.
General Tips [more...]Happy Holidays from ESI Group!
From everyone here at ESI Group, we would like to
wish you and your family a safe and happy holiday
season.