CFD-TOPO: A Tool for Feature Scale Simulation of Semiconductor Processes
CFD-TOPO is a simulation tool that predicts how the shape of
entities change due to the combined effects of chemical species
transport and surface reactions at gas-solid interfaces. This
application provides a wide array of tools to analyze the steps of a
semiconductor process on the feature scale of a device (typically the
order of micro-meter).
CFD-ACE+ and CFD-TOPO Coupling
There is a growing demand and challenge in different
industries, especially semiconductor and MEMS areas,
to have increased wafer size with reduced feature
size, i.e. high quality process uniformity.
CFD-TOPO User Tips 
