The paper gives an overview of the different applications of the numerical simulation in chemical vapour deposition (CVD) process and equipment. In particular, emphasis will be given to the modelling of Rapid Thermal Low Pressure CVD and to the perspective of modelling Spray CVD.
Keywords
Chemical Vapor Deposition, Numerical simulation, Rapid Thermal Process,
Spray CVD
Source
Journal of Optoelectronics and Advanced Materials Vol. 7, No. 2, April 2005, p. 599 - 606
