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Home arrow CFD Paper Library arrow Software Tool arrow CFD-ACE arrow Flow Behavior at the Embossing Stage of Nanoimprint Lithography
Flow Behavior at the Embossing Stage of Nanoimprint Lithography
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Authors
Jun-Ho Jeong and Youn-Suk Choi Korea Institute of Machinery and Materials Young-Jae Shin, Jae-Jong Lee, Kyoung-Taik Park, Eung-Sug Lee, and Sang-Rok Lee KyungWon Tech Corporation
Abstract
Nanoimprint lithography (NIL) is a nanofabrication method known to be a low cost method of fabricating nanoscale patterns as small as 6 nm. This study is focused on understanding physical phenomena in the embossing of nano/micro scale structures with 100nm minimum feature size. We present the effects of capillary force and width of stamp groove on flow behavior at the embossing stage through numerical experimentation. We also compare our numerical results with previous experimental results and discuss our results.
Keywords
Nanoimprint lithography, Embossing stage, Capillary force, Surface tension, Numerical simulation
Source
Fibers and Polymers 2002, Vol.3, No.3, 00-00
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