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Home arrow CFD Paper Library arrow Industry Area arrow Semiconductor arrow All Papers in all subcategories
Industry Area - Semiconductor
Programming Characteristics of PRAM
Y.-T. Kim, Y.-N. Hwang, K.-H. Lee, S.-H. Lee, C.-W. Jeong, S.-J. Ahn, F. Yeung*, G.-H. Koh, H.-S. Jeong, W.-Y. Chung, T.-K. Kim, Y.-K. Park, K.-N. Kim, and J.-T. Kong Samsung Electronics
Reducing stress in silicon carbide epitaxial layers
O. Danielsson, C. Hallin, E. Janzen Linkoping University
Run-to-Run Control of Inductively Coupled C2F6 Plasma Etching of SiO2: Construction of a Numerical Process with a CFD Code
Seung Taek Seo, Kwang Soon Lee and Bum Kyoo Choi Sogang University Yong Hee Lee Samsung Electronics Dae Rook Yang Korea University
Simulation of Photoresist Thermal Flow Process with Viscous Flow Model
Won-Young Chung, Tai-Kyung Kim, Yero Lee, Jin-Young Yoon, Hyun-Woo Kim, Young-Kwan Park and Jeong-Taek Kong Samsung Electronics
 
Simulation technique for the PR flow process using a new viscous flow model
Won-Young Chung, Tai-Kyung Kim, Jin-Young Yoon, Hyun-Woo Kim, Young-Kwan Park, and Jeong-Taek Kong Samsung Electronics
Solving Electric Field in Combined Conductor and Dielectric Devices
Z.J. Chen and A. Przekwas CFD Research Corporation M. Athavale GE Power N. Zhou ESI-Group
Spatial distribution of resistive intergranular phase in stabilized zirconia estimated by millicontact impedance spectroscopy
Jong-Heun Lee, Young-Soo Jung, Doh-Yeon Kim Seoul National University Hyo-Sang Woo, Yong-Chae Chung Hanyang University
Using N2 as precursor gas in III-nitride CVD growth
O. . Danielsson and E. Janzen Linkoping University
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