Sirimon O-Charoen and Erdogan Gulari University of Michigan

David J.Beebe, Michael G. Olsen, Mark A. Stremler and Byung-Ho Jo Beckman Institute for Advanced Science and Technology Ronald J.Adrian and Hassan Aref University of Illinois at Urbana-Champaign David J.Beebe University of Wisconsin-Madison

Wonchul Sim, Sung-Jun Park, Changsung Park, Youngseuck Yoo, Youngjae Kim, Jaewoo Joung and Yongsoo Oh Samsung Electro-Mechanics Co. Ltd.

Fan Yang, Huiqi He, Donald C. Chang and Yi-Kuen Lee Hong Kong University of Science and Technology

Mo Yang and Cengiz S. Ozkan University of California, Riverside Huajian Gao Max Planck Institute for Metals Research

Frank Jones and Rob Bailey University of Tennessee at Chattanooga

M.M. Athavale, H.Y. Li, H.Q. Yang and A.J. Przekwas CFD Research Corporation C. Cabuz and W. Herb Honeywell Technology Center

M. M. Athavale, Z.J. Chen, M. Furmanczyk and A. J. Przekwas CFD Research Corporation

Zeta Tak For Yu, Yi-Kuen Lee, Man Wong and Yitshak Zohar Hong Kong University of Science and Technology

Cosme Furlong and Ryszard J. Pryputniewicz Worcester Polytechnic Institute

Peter Koltay, Jan Kalix and Roland Zengerle IMTEK