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Industry Area - Plasma

Profiling and modeling of dc nitrogen microplasmas

Chester G. Wilsona and Yogesh B. Gianchandani University of Michigan Robert R. Arslanbekov and Vladimir Kolobov CFD Research Corporation Amy E. Wendt University of Wisconsin

Neutral uniformity and transport mechanisms for plasma etching

Seokmin Yuna and George R. Tynan University of California, San Diego Vladimir Kolobov CFD Research Corporation

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